The Hitachi SU-70 Analytical Field Emission SEM combines the field proven stability, high current and brightness of the Schottky electron source with the ultra-high resolution required in a multitude of analytical applications. Designed with a semi-in-lens optical configuration, Hitachi’s patented ExB technology provides a unique electron signal filtering and mixing system suited for today’s demanding applications for research and development and multidiscipline studies.
The large specimen stage and analytical chamber accommodate a wide variety of analytical instrumentation such as EDS*, WDS*, EBSP*, CL*, STEM*, and e-Beam Lithography* techniques optimized for simultaneous analysis.
The SU-70 Analytical FESEM continues the tradition of providing industry leading technology coupled with the quality and reliability recognized throughout the industry in Hitachi products and services.
Ultra high resolution performance made possible with Hitachi’s patented semi-in-lens optical design and electron gun technology.
In-lens SE and BSE Signal Filtering and Mixing Mode
Enables SE and BSE signal collection and control to eliminate or reduce specimen charging and enhance compositional contrast information.
Sub Nanometer Level Surface Observation at Ultra Low Accelerating Voltages
Provides high resolution, sub nanometer level surface observation at ultra-low accelerating voltages down to 100 V by utilizing the electron beam deceleration function.
Maximum Probe Current of 100 nA or Greater Available with the Field Proven Schottky Electron Source
High current and high resolution conditions are optimized for analytical techniques such as EDS*, WDS*, EBSP*, CL*, and e-Beam lithography* for increased productivity and throughput.
EBSP Analysis In Field Free (FF) Mode
Hitachi’s unique FF mode eliminates the projected magnetic field of the objective lens associated with semi-in-lens technology, and thereby eliminates artifacts during analysis of magnetic samples and with EBSP*applications.
Large Analytical Specimen Chamber
Designed to optimize the simultaneous analysis of a wide variety of analytical techniques such as EDS*, WDS*, EBSP*, CL* and e-Beam Lithography* by optimizing the analytical detector solid angle and maintaining high resolution.