The AFM5500M is a SPM platform equipped with a fully addressable 4-inch stage, optimized for medium-sized samples. It affords exceptional levels of ease of use, automation, and accuracy, as well as correlation for AFM/SEM investigations.
Ease of Use
Significantly simplifying the AFM operation
Wide-open tip and sample access
Fully addressable 4-inch stage eliminating the need for sample remount/rotation
Point-and-click function enabling easy and quick camera-based sample navigation
All built-in accessories allowing seamless and software-controlled mode switching
Easy and quick positioning
Easier, faster, and more precise AFM imaging
Automated cantilever exchange
Automated laser alignment
Automated image optimization (RealTune® II)
Automated AFM measurements following a recipe
Automated cantilever exchange
Easy to remove/attach
Enhanced accuracy of AFM measurements
Flexure-based design providing superior flat and orthogonal scan
Closed-loop scanner allowing highly linear and accurate imaging
Low sensor noise yielding high-resolution and high-quality results
Tip evaluation capability ensuring probe quality and artifact-free images
Conventional AFM with a piezoelectric tube scanner requires data flattening or leveling because of its intrinsic curved motion. However, this flattening may distort a sample’ s micro-surface structure, including its Z value. The newly developed AFM5500M is equipped with a flexure-based scanner that enables well-controlled raster scans along X and Y directions only. As a result, this advanced scanner design can effectively eliminate background curvatures in a wide scan area and improve the accuracy of AFM measurements.
Sample ：Amorphous silicon thin film on a silicon substrate
Using a conventional piezoelectric tube scanner can cause cross-talk when bending the tube scanner.
This cross-talk leads to distortions and asymmetrization. The improved AFM5500M’s scanner reduces cross-talk making both accurate and symmetric measurements possible.
Sample : Textured-structure solar battery(having symmetrical structure due to its crystal orientation.)
* AFM5100N (with an open-loop scanner)
Correlative AFM and SEM Imaging
The Hitachi-proprietary SEM/AFM shared alignment holder provides quick and easy measurements and analysis of topography, structures, composition, and surface property.
The ovrlay images createed by using AZblend Ver.2.1, ASTRON Inc.
AFM and SEM Measurements of the Same Area (Sample:Graphene/SiO2)
Overlay images of SEM, AFM (topography), and KFM (surface potential)
It can be concluded from AFM cross-session height measurements that those contrast differences in the SEM image are corresponding to the variation of graphene layers in the AFM image.
It indicates that surface potential (work function) of graphene sheets is highly dependent on the sample thickness, i.e., the number of graphene layers.
High-precision 3D topographic data in conjunction with the electrical property examination provide strong evidence for identifying the root cause of captured variations in SEM contrasts.
Hitachi High-Tech Science will continue to develop AFM-correlated systems with other types of microscopes and inspection equipment.